Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process

ABSTRACT

A method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process is disclosed. The method may include: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of a cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. The method may also include; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO 4 ); wherein the ruthenium-containing film comprises a ruthenium-metal alloy. Semiconductor device structures including ruthenium-metal alloys deposited by the methods of the disclosure are also disclosed.

This application is a Continuation of, and claims priority to and the benefit of, U.S. Utility patent application Ser. No. 15/896,986, filed Feb. 14, 2018 and entitled “METHOD FOR DEPOSITING A RUTHENIUM-CONTAINING FILM ON A SUBSTRATE BY A CYCLICAL DEPOSITION PROCESS,” which is hereby incorporated by reference herein.

FIELD OF INVENTION

The present disclosure relates generally to methods for depositing a ruthenium-containing film on a substrate by a cyclical deposition process and particularly methods for depositing a ruthenium-metal alloy employing a metalorganic precursor and ruthenium tetroxide.

BACKGROUND OF THE DISCLOSURE

Semiconductor device fabrication processes in advanced technology nodes generally require state of the art deposition methods for forming metal containing film, such as, for example, a ruthenium-containing film.

A common requisite for the deposition of a metal containing film is that the deposition process is extremely conformal. For example, conformal deposition is often required in order to uniformly deposit a metal containing film over three-dimensional structures including high aspect ratio features. Another common requirement for the deposition of metal containing films is that the deposition process is capable of depositing ultra-thin films which are continuous over a large substrate area. In the particular case wherein the metal containing film is electrically conductive, the deposition process may need to be optimized to produce low resistance conductive films.

Cyclical deposition processes, such as, for example, atomic layer deposition (ALD) and cyclical chemical vapor deposition (CCVD), sequentially introduce two or more precursors (reactants) into a reaction chamber wherein the precursors react with the surface of the substrate one at a time in a sequential, self-limiting, manner. Cyclical deposition processes have been demonstrated which produce metal containing films with excellent conformality with atomic level thickness control.

Cyclical deposition methods may be utilized to deposition elemental metals, such as, for example, copper (Cu), ruthenium (Ru), platinum (Pt), and palladium (Pd). For example, an elemental metal may be deposited by atomic layer deposition utilizing a metal containing precursor and molecular oxygen (O₂). However, in some semiconductor device applications molecular oxygen (O₂) may not be an ideal precursor for depositing elemental metals. Accordingly, alternative oxygen sources are desirable as precursors in cyclical deposition processes.

Cyclical deposition methods may also be utilized for the deposition of metal alloys. For example, metal alloys may be deposited by an atomic layer deposition process utilizing a first precursor including a first metal and a second precursor including a second metal. Ruthenium-metal alloys may have superior thermal stability compared with more common metallic alloys and in addition may exhibit a low electrical resistivity. In electrical interconnect applications for integrated circuits, a ruthenium-metal alloy may have favorable barrier layer characteristics for preventing diffusion of metallic interconnect materials and is therefore attracting interest as a suitable material for use in semiconductor device fabrication. Accordingly, methods for depositing ruthenium-metal alloys and semiconductor device structures including ruthenium-metal alloys are desirable.

SUMMARY OF THE DISCLOSURE

This summary is provided to introduce a selection of concepts in a simplified form. These concepts are described in further detail in the detailed description of example embodiments of the disclosure below. This summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter.

In some embodiments, methods for depositing a ruthenium-containing film on a substrate by a cyclical deposition process are provided. The method may comprise: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. The method may also comprise; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄); wherein the ruthenium-containing film comprises a ruthenium-metal alloy.

In some embodiments of the disclosure, the second vapor phase reactant may comprise osmium tetroxide (OsO₄) and the films deposited by the embodiments of the disclosure may comprise osmium-containing films, such as, for example, osmium-metal alloys.

For purposes of summarizing the invention and the advantages achieved over the prior art, certain objects and advantages of the invention have been described herein above. Of course, it is to be understood that not necessarily all such objects or advantages may be achieved in accordance with any particular embodiment of the invention. Thus, for example, those skilled in the art will recognize that the invention may be embodied or carried out in a manner that achieves or optimizes one advantage or group of advantages as taught or suggested herein without necessarily achieving other objects or advantages as may be taught or suggested herein.

All of these embodiments are intended to be within the scope of the invention herein disclosed. These and other embodiments will become readily apparent to those skilled in the art from the following detailed description of certain embodiments having reference to the attached figures, the invention not being limited to any particular embodiment(s) disclosed.

BRIEF DESCRIPTION OF THE DRAWING FIGURES

While the specification concludes with claims particularly pointing out and distinctly claiming what are regarded as embodiments of the invention, the advantages of embodiments of the disclosure may be more readily ascertained from the description of certain examples of the embodiments of the disclosure when read in conjunction with the accompanying drawings, in which:

FIG. 1 illustrates a process flow of an exemplary cyclical deposition method for depositing a ruthenium-metal alloy according to the embodiments of the disclosure;

FIG. 2 illustrates a cross sectional schematic diagram of a semiconductor structure including a ruthenium-metal alloy deposited according to the embodiments of the disclosure;

FIG. 3 illustrates a cross section schematic diagram of partially fabricated semiconductor structure including a ruthenium-metal alloy deposited according to the embodiments of the disclosure;

FIG. 4 illustrates a cross section schematic diagram of a semiconductor structure including a trench, or via, filled with a ruthenium-metal alloy deposited according to the embodiments of the disclosure.

FIG. 5 schematically illustrates a reaction system configured to perform the embodiments of the disclosure.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Although certain embodiments and examples are disclosed below, it will be understood by those in the art that the invention extends beyond the specifically disclosed embodiments and/or uses of the invention and obvious modifications and equivalents thereof. Thus, it is intended that the scope of the invention disclosed should not be limited by the particular disclosed embodiments described below.

The illustrations presented herein are not meant to be actual views of any particular material, structure, or device, but are merely idealized representations that are used to describe embodiments of the disclosure.

As used herein, the term “cyclic deposition” may refer to the sequential introduction of precursors (reactants) into a reaction chamber to deposit a film over a substrate and includes deposition techniques such as atomic layer deposition and cyclical chemical vapor deposition.

As used herein, the term “cyclical chemical vapor deposition” may refer to any process wherein a substrate is sequentially exposed to two or more volatile precursors, which react and/or decompose on a substrate to produce a desired deposition.

As used herein, the term “substrate” may refer to any underlying material or materials that may be used, or upon which, a device, a circuit or a film may be formed.

As used herein, the term “atomic layer deposition” (ALD) may refer to a vapor deposition process in which deposition cycles, preferably a plurality of consecutive deposition cycles, are conducted in a process chamber. Typically, during each cycle the precursor is chemisorbed to a deposition surface (e.g., a substrate surface or a previously deposited underlying surface such as material from a previous ALD cycle), forming a monolayer or sub-monolayer that does not readily react with additional precursor (i.e., a self-limiting reaction). Thereafter, if necessary, a reactant (e.g., another precursor or reaction gas) may subsequently be introduced into the process chamber for use in converting the chemisorbed precursor to the desired material on the deposition surface. Typically, this reactant is capable of further reaction with the precursor. Further, purging steps may also be utilized during each cycle to remove excess precursor from the process chamber and/or remove excess reactant and/or reaction byproducts from the process chamber after conversion of the chemisorbed precursor. Further, the term “atomic layer deposition,” as used herein, is also meant to include processes designated by related terms such as, “chemical vapor atomic layer deposition”, “atomic layer epitaxy” (ALE), molecular beam epitaxy (MBE), gas source MBE, or organometallic MBE, and chemical beam epitaxy when performed with alternating pulses of precursor composition(s), reactive gas, and purge (e.g., inert carrier) gas.

As used herein, the term “film” and “thin film” may refer to any continuous or non-continuous structures and material deposited by the methods disclosed herein. For example, “film” and “thin film” could include 2D materials, nanorods, nanotubes, or nanoparticles or even partial or full molecular layers or partial or full atomic layers or clusters of atoms and/or molecules. “Film” and “thin film” may comprise material or a layer with pinholes, but still be at least partially continuous.

As used herein, the term “metalorganic” or “organometallic” are used interchangeably and may refer to organic compounds containing a metal species. Organometallic compounds may be considered to be subclass of metalorganic compounds having direct metal-carbon bonds.

A number of example materials are given throughout the embodiments of the current disclosure, it should be noted that the chemical formulas given for each of the example materials should not be construed as limiting and that the non-limiting example materials given should not be limited by a given example stoichiometry

The present disclosure includes methods that may be utilized to deposit ruthenium-containing films and in particular deposition methods utilized for depositing ruthenium-metal alloys employing a metalorganic precursor and ruthenium tetroxide (RuO₄).

The electrical resistance of titanium silicide based contacts (e.g., TiSi₂) increases dramatically as device features are scaled down in advanced technology nodes. Cobalt silicide (e.g., CoSi₂) based contacts have been proposed as an alternative contact material due its low resistivity and high thermal stability. For example, CoSi₂ may be formed by depositing a cobalt (Co) film and subsequently performing a self-aligned silicide process which comprises annealing cobalt (Co) at temperature greater than 450° C.

In addition to low resistance contact applications, cobalt (Co) has been proposed as both a barrier layer and a capping layer in back-end-of-line (BEOL) copper interconnection applications. For example, a thin film of cobalt (Co) may be utilized in BEOL copper interconnects to prevent dewetting of copper from the underlying dielectric material as well as preventing copper diffusion across the boundary between the copper and the dielectric. However, common cobalt (Co) deposition processes utilize sputtering techniques which have inherently poor step coverage. Therefore, the embodiments of the disclosure may comprise methods to deposit high quality, conformal, cobalt (Co) films.

Ruthenium (Ru) is a potential high-work function electrode material for DRAM capacitors and MOSFETs. In addition, ruthenium may have useful applications as fuel cell electrodes, catalysts, and as seed layers for the electrodeposition of copper (Cu) on barrier layers for integrated circuit interconnects. However, ruthenium precursors are prohibitively expensive making the deposition of elemental ruthenium not cost effective. The methods of the disclosure therefore comprise methods for depositing ruthenium-metal alloys which may tailor the composition of the ruthenium-metal alloy based on the desired semiconductor device application, thereby utilizing less ruthenium precursor whilst depositing a ruthenium-metal alloy with adapted properties.

Therefore, the embodiments of the disclosure may comprise a method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process. The method may comprise: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. The method may also comprise; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄); wherein the ruthenium-containing film comprises a ruthenium-metal alloy.

In some embodiments of the disclosure, the second vapor phase reactant may comprise osmium tetroxide, and the embodiments of the disclosure may deposit osmium-containing films, such as, for example, osmium-metal alloys.

A non-limiting example embodiment of a cyclical deposition process may include atomic layer deposition (ALD), wherein ALD is based on typically self-limiting reactions, whereby sequential and alternating pulses of reactants are used to deposit about one atomic (or molecular) monolayer of material per deposition cycle. The deposition conditions and precursors are typically selected to provide self-saturating reactions, such that an adsorbed layer of one reactant leaves a surface termination that is non-reactive with the gas phase reactants of the same reactant. The substrate is subsequently contacted with a different reactant that reacts with the previous termination to enable continued deposition. Thus, each cycle of alternated pulses typically leaves no more than about one monolayer of the desired material. However, as mentioned above, the skilled artisan will recognize that in one or more ALD cycles more than one monolayer of material may be deposited, for example if some CVD reactions, for example decomposition, or surface controlled reactions of two chemicals, occur despite the alternating nature of the process.

In an ALD-type process for depositing a ruthenium-containing film and particularly a ruthenium-metal alloy, one deposition cycle may comprise exposing the substrate to a first reactant, removing any unreacted first reactant and reaction byproducts from the reaction space and exposing the substrate to a second reactant, followed by a second removal step. The first reactant may comprise a metalorganic precursor (“the metalorganic precursor”) and the second reactant may comprise ruthenium tetroxide (“the ruthenium precursor”). In some embodiments, the first reactant may comprise a metalorganic precursor (“the metalorganic precursor”) and the second reactant may comprise osmium tetroxide (“the osmium precursor”).

Precursors may be separated by inert gases, such as argon (Ar) or nitrogen (N₂), to prevent/minimize gas-phase or CVD reactions between reactants and enable self-saturating surface reactions. In some embodiments, however, the substrate may be moved to separately contact a first vapor phase reactant and a second vapor phase reactant. Because the reactions self-saturate, strict temperature control of the substrates and precise dosage control of the precursors is not usually required. However, the substrate temperature is preferably such that an incident gas species does not condense into monolayers nor decompose on the surface. Surplus chemicals and reaction byproducts, if any, are removed from the substrate surface, such as by purging the reaction space or by moving the substrate, before the substrate is contacted with the next reactive chemical. Undesired gaseous molecules can be effectively expelled from a reaction space with the help of an inert purging gas. A vacuum pump may be used to assist in the purging.

Reactors capable of being used to deposit ruthenium-containing films can be used for the deposition. Such reactors include ALD reactors, as well as CVD reactors equipped with appropriate equipment and means for providing the precursors. According to some embodiments, a showerhead reactor may be used. According to some embodiments, cross-flow, batch, minibatch, or spatial ALD reactors may be used.

Examples of suitable reactors that may be used include commercially available single substrate (or single wafer) deposition equipment such as Pulsar® reactors (such as the Pulsar® 2000 and the Pulsar® 3000 and Pulsar® XP ALD), and EmerALD® XP and the EmerALD® reactors, available from ASM America, Inc. of Phoenix, Ariz. and ASM Europe B.V., Almere, Netherlands. Other commercially available reactors include those from ASM Japan K.K (Tokyo, Japan) under the tradename Eagle® XP and XP8. In some embodiments, the reactor is a spatial ALD reactor, in which the substrates moves or rotates during processing.

In some embodiments of the disclosure a batch reactor may be used. Suitable batch reactors include, but are not limited to, Advance® 400 Series reactors commercially available from and ASM Europe B.V (Almere, Netherlands) under the trade names A400 and A412 PLUS. In some embodiments, a vertical batch reactor is utilized in which the boat rotates during processing, such as the A412. Thus, in some embodiments the wafers rotate during processing. In other embodiments, the batch reactor comprises a minibatch reactor configured to accommodate 10 or fewer wafers, 8 or fewer wafers, 6 or fewer wafers, 4 or fewer wafers, or 2 or fewer wafers. In some embodiments in which a batch reactor is used, wafer-to-wafer non-uniformity is less than 3% (1 sigma), less than 2%, less than 1% or even less than 0.5%.

The deposition processes described herein can optionally be carried out in a reactor or reaction space connected to a cluster tool. In a cluster tool, because each reaction space is dedicated to one type of process, the temperature of the reaction space in each module can be kept constant, which improves the throughput compared to a reactor in which the substrate is heated up to the process temperature before each run. Additionally, in a cluster tool it is possible to reduce the time to pump the reaction space to the desired process pressure levels between substrates. In some embodiments of the disclosure, the deposition process may be performed in a cluster tool comprising multiple reaction chambers, wherein each individual reaction chamber may be utilized to expose the substrate to an individual precursor gas and the substrate may be subsequently transferred between different reaction chambers for exposure to multiple precursor gases, the transfer of the substrate being performed under a controlled ambient to prevent oxidation/contamination of the substrate. In some embodiments of the disclosure, the deposition process may be performed in a cluster tool comprising multiple reaction chambers, wherein each individual reaction chamber may be configured to heat the substrate to a different deposition temperature.

A stand-alone reactor can be equipped with a load-lock. In that case, it is not necessary to cool down the reaction space between each run. In some embodiments a deposition process for depositing a metal containing film may comprise a plurality of deposition cycles, for example ALD cycles or cyclical CVD cycles.

In some embodiments the cyclical deposition processes are used to deposit ruthenium-containing films on a substrate and the cyclical deposition process may be an ALD type process. In some embodiments the cyclical deposition may be a hybrid ALD/CVD or cyclical CVD process. For example, in some embodiments the growth rate of the ALD process may be low compared with a CVD process. One approach to increase the growth rate may be that of operating at a higher substrate temperature than that typically employed in an ALD process, resulting in a chemical vapor deposition process, but still taking advantage of the sequential introduction of precursors, such a process may be referred to as cyclical CVD.

According to some embodiments of the disclosure, ALD processes may be used to form a ruthenium-containing film on a substrate, such as an integrated circuit workpiece. In some embodiments of the disclosure, each ALD cycle comprises two distinct deposition steps or phases. In a first phase of the deposition cycle (“the metal phase”), the substrate surface on which deposition is desired is contacted with a first vapor phase reactant comprising a metal precursor which chemisorbs onto the substrate surface, forming no more than about one monolayer of reactant species on the surface of the substrate. In a second phase of the deposition (“the ruthenium phase”), the substrate surface on which deposition is desired is contacted with a second vapor phase reactant comprising ruthenium tetroxide, wherein the ruthenium tetroxide may react to form a ruthenium-metal alloy.

In some embodiments, the second phase of the deposition may comprise contacting the substrate with osmium tetroxide (OsO₄) (“the osmium phase”), wherein the osmium tetroxide (OsO₄) may react to form an osmium-metal alloy.

In some embodiments of the disclosure, the first vapor phase reactant may comprise a metal containing precursor, also referred to here as the “metal compound”. In some embodiments, the metal containing precursor may comprise a metal having an oxidation state of 0, +I, +II, +III, +IV, +V, or +VI. In some embodiments, the oxidation state of the metal in the metal containing precursor may be +II, or +III. In some embodiments, the oxidation state of the metal in the metal containing precursor may not equal 0.

In some embodiments, the first vapor phase reactant may comprise a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. In some embodiments, the metalorganic precursor may be free of, or substantially free of, metals from Group 2 of the periodic table, i.e., the alkaline earth metals. In some embodiments, the metalorganic precursor may be free of, or substantially free of, metals selected from the group consisting of calcium (Ca), strontium (Sr), and barium (Ba).

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic cobalt precursor, i.e., a metalorganic precursor comprising a cobalt element. In some embodiments, the metalorganic cobalt precursor may comprise cyclopentadienyl compounds of cobalt, cobalt betadiketonate compounds, or cobalt amidinate compounds or other metal-organic cobalt compounds. In some embodiments, the metalorganic cobalt precursor may be selected from the group consisting of bis(acetylacetonate)cobalt(II), bis(ethylcyclopentadienyl)cobalt(II), bis(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt(II), bis(1,4-di-tert-butyl-1,3-diazabutadiene)cobalt(II), or bis(N-tert-butyl-N′-ethylpropanimidamidato)cobalt(II).

In some embodiments, the cobalt element (Co) is bonded to at least one nitrogen (N) atom. In some embodiments, the cobalt element (Co) is bonded to at least one carbon (C) atom. In some embodiments, the cobalt element (Co) is bonded to at least one ligand through two nitrogen atoms. In some embodiments, the cobalt element (Co) is bonded to at least two ligands through two nitrogen (N) atoms in each ligand. In some embodiments, the cobalt element (Co) is bonded to at least one oxygen (O) atom. In some embodiments, the Cobalt (Co) containing precursor does not comprise, or substantially does not comprise, a halide component.

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic nickel precursor, i.e., a metalorganic precursor comprising a nickel element. In some embodiments, the metalorganic nickel precursor may comprise cyclopentadienyl compounds of nickel, nickel betadiketonate compounds or nickel amidinate compounds or other metal-organic nickel compounds. In some embodiments, the metalorganic nickel precursor may be selected from the group consisting of bis(acetylacetonate)nickel(II), bis(cyclopentadienyl)nickel(II), bis(1,4-di-tert-butyl-1,3-diazabutadiene)nickel(II), bis(N-tert-butyl-N′-ethylpropanimidamidato)nickel(II) or bis(4-N-ethylamino-3-penten-2-N-ethyliminato) nickel(II).

In some embodiments, the nickel element (Ni) is bonded to at least one nitrogen (N) atom. In some embodiments, the nickel element (Ni) is bonded to at least one carbon (C) atom. In some embodiments, the nickel element (Ni) is bonded to at least one ligand through two nitrogen (N) atoms. In some embodiments, the nickel element (Ni) is bonded to at least two ligands through two nitrogen (N) atoms in each ligand. In some embodiments, the nickel element (Ni) is bonded to at least one oxygen (O). In some embodiments the Ni containing metal precursor does not comprise, or substantially does not comprise, a halide component.

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic tungsten precursor, i.e., a metalorganic precursor comprising a tungsten element. In some embodiments, the metalorganic tungsten precursor may comprise cyclopentadienyl compounds of tungsten, tungsten betadiketonate compounds, tungsten alkylamine or tungsten amidinate compounds or other metalorganic tungsten compounds. In some embodiments, the metalorganic tungsten precursor may be selected from the group consisting of bis(tert-butylimino)bis(tertbutylamino)tungsten(VI), bis(isopropylcyclopentadienyl)tungsten(IV) dihydride, or tetracarbonyl(1,5-cyclooctadiene)tungsten(0).

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic molybdenum precursor, i.e., a metalorganic precursor comprising a molybdenum element. In some embodiments, the metalorganic molybdenum precursor may comprise cyclopentadienyl compounds of molybdenum, molybdenum betadiketonate compounds, molybdenum alkylamine or molybdenum amidinate compounds or other metal-organic molybdenum compounds. In some embodiments, the metalorganic molybdenum precursor may be selected from the group consisting of (Bicyclo[2.2.1]hepta-2,5-diene)tetracarbonylmolybdenum(0), or (propylcyclopentadienyl)molybdenum(I)tricarbonyl dimer.

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic manganese precursor, i.e., a metalorganic precursor comprising a manganese element. In some embodiments, the metalorganic manganese precursor may comprise cyclopentadienyl compounds of manganese, manganese betadiketonate compounds, manganese alkylamine or manganese amidinate compounds or other metalorganic manganese compounds. In some embodiments, the metalorganic manganese precursor may be selected from the group consisting of bis(N,N′-di-isopropylpentylamidinato)manganese(II), bis(cyclopentadienyl) manganese(II), or cyclopentadienylmanganese(I)tricarbonyl.

In some embodiments of the disclosure, the metalorganic precursor may comprise a metalorganic iron precursor, i.e., a metalorganic precursor comprising an iron element. In some embodiments, the metalorganic iron precursor may comprise cyclopentadienyl compounds of iron, iron betadiketonate compounds, iron alkylamine or iron amidinate compounds or other metalorganic iron compounds. In some embodiments, the metalorganic iron precursor may be selected from the group consisting of bis(N,N′-di-tertbutylacetamidinato)iron(II), biscyclopentadienyl)iron(II), or cyclohexadienetricarbonyliron(0).

In some embodiments of the disclosure, contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor may comprise exposing the substrate to the metalorganic precursor for a time period of between about 0.01 seconds and about 60 seconds, between about 0.05 seconds and about 10 seconds, or between about 0.1 seconds and about 5.0 seconds. In addition, during the pulsing of the metal containing precursor, e.g., the metalorganic precursor, the flow rate of the metalorganic precursor may be less than 2000 sccm, or less than 500 sccm, or even less than 100 sccm. In addition, during the pulsing of the metalorganic precursor over the substrate the flow rate of the metalorganic precursor may be, or vary from, about 1 to 2000 sccm, from about 5 to 1000 sccm, or from about 10 to about 500 sccm.

Excess metalorganic precursor and reaction byproducts (if any) may be removed from the surface, e.g., by pumping with an inert gas. For example, in some embodiments of the disclosure, the methods may comprise a purge cycle wherein the substrate surface is purged for a time period of less than approximately 2.0 seconds. Excess metalorganic precursor and any reaction byproducts may be removed with the aid of a vacuum, generated by a pumping system, in fluid communication with the reaction chamber.

In a second phase of the deposition cycle (“the ruthenium phase”) the substrate may be contacted with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄). In some embodiments of the disclosure, the ruthenium component of the ruthenium tetroxide may have an oxidation state of +VIII, or at least +VII. In some embodiments, the ruthenium component of the ruthenium tetroxide may have an oxidation state of at least +III, or greater than 0.

In some embodiments of the disclosure, the ruthenium tetroxide (RuO₄) may be dissolved in a solvent, such as, for example, an inert organic solvent, or a fluorocarbon solvent such as an ethyl-methyl-fluorinated solvent mixture. In some embodiments, the concentration (% w/w) of the ruthenium tetroxide (RuO₄) in the solvent may be greater than 0.01%, or greater than 0.1%, or greater than 0.5%, or greater than 1.0%, or even greater than 1.5%. In some embodiments, the concentration (% w/w) of the ruthenium tetroxide (RuO₄) in the solvent may be less than 100%, or less than 50%, or less than 20%, or less than 10%, or less than 5%, or less than 2%, or even less than 1%. Ruthenium tetroxide (RuO₄) precursors and their uses are described in U.S. Patent App. 2011/0171836 A1, and incorporated by reference herein.

In some embodiments of the disclosure, the second phase of the deposition cycle may comprise contacting the substrate with osmium tetroxide (OsO₄) (“the osmium phase”).

In some embodiments, exposing the substrate to ruthenium tetroxide (RuO₄) or osmium tetroxide (OsO₄) may comprise pulsing the ruthenium tetroxide (RuO₄) precursor or the osmium tetroxide (OsO₄) precursor over the substrate for a time period of between 0.1 seconds and 2.0 seconds, or from about 0.01 seconds to about 10 seconds, or less than about 20 seconds, less than about 10 seconds or less than about 5 seconds. During the pulsing of the ruthenium tetroxide (RuO₄) precursor or the osmium tetroxide (OsO₄) precursor over the substrate the flow rate of the ruthenium tetroxide (RuO₄) or the osmium tetroxide (OsO₄) may be less than 2000 sccm, may be less than 500 sccm, may be less than 100 sccm, may be less than 50 sccm, or less than 25 sccm, or less than 15 sccm, or even less than 10 sccm.

In some embodiments of the disclosure, the ruthenium tetroxide (RuO₄) may be dissolved into a suitable solvent and the flow rate of the ruthenium tetroxide (RuO₄) dissolved in the solvent may be between 0.00001 sccm and 2000 sccm, or between 0.001 sccm and 100 sccm, or between 0.1 sccm and 20 sccm.

The second vapor phase reactant comprising ruthenium tetroxide (RuO₄) may react with the metal-containing molecules left on the substrate. In some embodiments, the second phase precursor may comprise ruthenium tetroxide (RuO₄) and the reaction may deposit a ruthenium-metal alloy.

In some embodiments, the second vapor phase reactant may comprise osmium tetroxide (OsO₄) which may react with the metal-containing molecules left on the substrate thereby depositing an osmium-metal alloy.

Excess second vapor phase reactant (e.g., ruthenium tetroxide (RuO₄)) and reaction byproducts, if any, may be removed from the substrate surface, for example, by a purging gas pulse and/or vacuum generated by a pumping system. Purging gas is preferably any inert gas, such as, without limitation, argon (Ar), nitrogen (N₂), or helium (He). A phase is generally considered to immediately follow another phase if a purge (i.e., purging gas pulse) or other reactant removal step intervenes.

The deposition cycle in which the substrate is alternatively contacted with the first vapor phase reactant (i.e., the metalorganic precursor) and the second vapor phase reactant (e.g., ruthenium tetroxide (RuO₄)) may be repeated one or more times until a desired thickness of a ruthenium-containing film or an osmium-containing film is deposited. It should be appreciated that in some embodiments of the disclosure, the order of the contacting of the substrate with the first vapor phase reactant and the second vapor phase reactant may be such that the substrate is first contacted with the second vapor phase reactant followed by the first vapor phase reactant. In addition, in some embodiments, the cyclical deposition process may comprise contacting the substrate with the first vapor phase reactant (i.e. the metalorganic precursor) one or more times prior to contacting the substrate with the second vapor phase reactant (e.g., ruthenium tetroxide (RuO₄)) one or more times and similarly may alternatively comprise contacting the substrate with the second vapor phase reactant one or more times prior to contacting the substrate with the first vapor phase reactant one or more times. In addition, some embodiments of the disclosure may comprise non-plasma reactants, e.g., the first and second vapor phase reactants are substantially free of ionized reactive species. In some embodiments, the first and second vapor phase reactants are substantially free of ionized reactive species, excited species or radical species. For example, both the first vapor phase reactant and the second vapor phase reactant may comprise non-plasma reactants to prevent ionization damage to the underlying substrate and the associated defects thereby created.

The cyclical deposition processes described herein, utilizing a metalorganic precursor and ruthenium tetroxide (RuO₄) to deposit a ruthenium-metal alloy, may be performed in an ALD or CVD deposition system with a heated substrate. For example, in some embodiments, methods may comprise heating the substrate to temperature of between approximately 80° C. and approximately 150° C., or even heating the substrate to a temperature of between approximately 80° C. and approximately 120° C. Of course, the appropriate temperature window for any given cyclical deposition process, such as, for an ALD reaction, will depend upon the surface termination and reactant species involved. Here, the temperature varies depending on the precursors being used and is generally at or below about 700° C. In some embodiments, the deposition temperature is generally at or above about 100° C. for vapor deposition processes, in some embodiments the deposition temperature is between about 100° C. and about 250° C., and in some embodiments the deposition temperature is between about 120° C. and about 200° C. In some embodiments the deposition temperature is below about 500° C., below about 400° C. or below about 300° C. In some instances the deposition temperature can be below about 200° C., below about 150° C. or below about 100° C. In some instances the deposition temperature can be above about 20° C., above about 50° C. and above about 75° C. In some embodiments of the disclosure, the deposition temperature i.e., the temperature of the substrate during deposition is approximately 150° C.

In some embodiments the growth rate of the ruthenium-containing film is from about 0.005 Å/cycle to about 5 Å/cycle, from about 0.01 Å/cycle to about 2.0 Å/cycle. In some embodiments the growth rate of the ruthenium-containing film is more than about 0.05 Å/cycle, more than about 0.1 Å/cycle, more than about 0.15 Å/cycle, more than about 0.20 Å/cycle, more than about 0.25 Å/cycle or more than about 0.3 Å/cycle. In some embodiments the growth rate of the ruthenium-containing film is less than about 20.0 Å/cycle, less than about 10.0 Å/cycle, less than about 5.0 Å/cycle, less than about 2.0 Å/cycle, less than about 1.0 Å/cycle, less than about 0.75 Å/cycle, less than about 0.5 Å/cycle, or less than about 0.2 Å/cycle.

The embodiments of the disclosure may comprise a cyclical deposition which may be illustrated in more detail by exemplary method 100 of FIG. 1. The method 100 may begin with process block 110 which comprises providing at least one substrate into a reaction chamber and heating the substrate to the deposition temperature, for example, the substrate may comprise a bulk silicon substrate, the reaction chamber may comprise an atomic layer deposition reaction chamber and the substrate may be heated to a deposition of approximately 150° C. The method 100 may continue with process block 120 which comprises contacting the substrate with a metal containing vapor phase reactant, for example, the substrate may be contacted with a metalorganic precursor for a time period of approximately 1 second. Upon contacting the substrate with the metalorganic precursor, excess metalorganic precursor and any reaction byproducts may be removed from the reaction chamber by a purge/pump process. The method 100 may continue with process block 130 which comprises, contacting the substrate with ruthenium tetroxide (RuO₄) for a time period of approximately 4 seconds. Upon contacting the substrate with the ruthenium tetroxide (RuO₄) precursor, the excess RuO₄ precursor and any reaction byproducts may be removed from the reaction chamber by a purge/pump process.

The method wherein the substrate is alternatively and sequentially contacted with the metalorganic precursor and contacted with the ruthenium tetroxide (RuO₄) precursor may constitute one deposition cycle. In some embodiments of the disclosure, the method of depositing a ruthenium-containing film may comprise repeating the deposition cycle one or more times. For example, the method 100 may continue with decision gate 140 which determines if the method 100 continues or exits. The decision gate of process block 140 is determined based on the thickness of the ruthenium-containing film deposited, for example, if the thickness of the ruthenium-containing film is insufficient for the desired device structure, then the method 100 may return to process block 120 and the processes of contacting the substrate with the metalorganic precursor and contacting the substrate with the ruthenium tetroxide (Rua′) precursor may be repeated one or more times. Once the ruthenium-containing film has been deposited to a desired thickness the method may exit 150 and the ruthenium-containing film may be subjected to additional processes to form a device structure.

In some embodiments of the disclosure, the method 100 may comprise an additional process step comprising, contacting the substrate with a third vapor phase reactant comprising a reducing agent. In some embodiments, the reducing agent may comprise at least one of hydrogen (H₂), a hydrogen plasma, hydrogen radicals, hydrogen atoms, excited species of hydrogen, ammonia (NH₃), an ammonia (NH₃) plasma, hydrazine (N₂H₄), silane (SiH₄), disilane (Si₂H₆), trisilane (Si₃H₈), germane (GeH₄), digermane (Ge₂H₆), or diborane (B₂H₆).

In some embodiments of the disclosure, the reducing agent may comprise an organic precursor, such as, for example, alcohols, aldehydes, or carboxylic acids or other organic compounds may be utilized. For example, organic compounds not having metals or semimetals, but comprising an —OH group. Alcohols can be primary alcohols, secondary alcohols, tertiary alcohols, polyhydroxy alcohols, cyclic alcohols, aromatic alcohols, and other derivatives of alcohols.

In some embodiments, the primary alcohols may have an —OH group attached to a carbon atom which is bonded to another carbon atom, in particular primary alcohols according to the general formula (I):

R¹—OH  (I)

wherein R¹ is a linear or branched C₁-C₂₀ alkyl or alkenyl group, such as, for example, methyl, ethyl, propyl, butyl, pentyl, or hexyl. In non-limiting example embodiments of the disclosure, the primary alcohols may comprise methanol, ethanol, propanol, butanol, 2-methyl propanol, or 2-methyl butanol.

In some embodiments, the secondary alcohols may have an —OH group attached to a carbon atom that is bonded to two other carbon atoms. In particular, secondary alcohols may have the general formula (II):

wherein each R¹ is selected independently from the group of linear or branched C₁-C₂₀ alkyl and alkenyl groups, such as, for example, methyl, ethyl, propyl, butyl, pentyl, or hexyl. As a non-limiting example embodiment of the disclosure, the second alcohols may comprise 2-propanol, or 2-butanol.

In some embodiments, the tertiary alcohols may have an —OH group attached to a carbon atom that is bonded to three other carbon atoms. In particular, tertiary alcohols may have the general formula (III):

wherein each R¹ is selected independently from the group of linear or branched C₁-C₂₀ alkyl and alkenyl groups, such as, for example, methyl, ethyl, propyl, butyl, pentyl, or hexyl. As a non-limiting example embodiment of the disclosure, the tertiary alcohols may comprise tert-butanol.

In some embodiments, polyhydroxy alcohols, such as diols and trials, have primary, secondary and/or tertiary alcohol groups as described above. Examples of polyhydroxy alcohols include, but are not limited to, ethylene glycol and glycerol.

In some embodiments, cyclic alcohols have an —OH group attached to at least one carbon atom which is part of a ring of 1 to 10, or between 5-6 carbon atoms.

In some embodiments, aromatic alcohols have at least one —OH group attached to either a benzene ring or to a carbon atom in a side chain.

In some embodiments, organic precursors containing at least one aldehyde group (—CHO) are selected from the group consisting of compounds having the general formula (V), alkanedial compounds having the general formula (VI), and other derivatives of aldehydes.

Therefore, in some embodiments, the organic precursor may comprise an aldehyde having the general formula (V):

R³—CHO  (V)

wherein R³ is selected from the group consisting of hydrogen and linear or branched C₁-C₂₀ alkyl and alkenyl groups, such as, for example, methyl, ethyl, propyl, butyl, pentyl, or hexyl. In some embodiments, R³ is selected from the group consisting of methyl or ethyl. Examples of compounds according to formula (V) are formaldehyde, acetaldehyde and butyraldehyde.

In some embodiments, the organic precursor are aldehydes having the general formula (VI):

OHC—R⁴—CHO  (VI)

wherein R⁴ is a linear or branched C₁-C₂₀ saturated or unsaturated hydrocarbon. Alternatively, the aldehyde groups may be directly bonded to each other (R⁴ is null).

In some embodiments, organic precursors containing at least one —COOH group are selected from the group consisting of compounds of the general formula (VII), polycarboxylic acids, and other derivatives of carboxylic acids.

Therefore, in some embodiments, organic precursors are carboxylic acids having the general formula (VII);

R⁵—COOH  (VII)

wherein R⁵ is hydrogen or linear or branched C₁-C₂₀ alkyl or alkenyl group, such as, for example, methyl, ethyl, propyl, butyl, pentyl, or hexyl. In some embodiments, R⁵ may be a linear or branched C₁-C₃ alkyl or alkenyl group. Non-limiting example embodiments of compounds according to formula (VII) may comprise formic acid, propanoic acid, or acetic acid.

The third vapor phase reactant comprising a reducing agent may be introduced into the reaction chamber and contact the substrate at a number process stages in exemplary method 100. In some embodiments of the disclosure, the reducing agent may be introduced into the reaction chamber and contact the substrate separately from the first vapor phase reactant and separately from the second vapor phase reactant. For example, the reducing agent may be introduced into the reaction chamber and contact the substrate prior to contacting the substrate with the metalorganic precursor, after contacting the substrate with the metalorganic and prior to contacting the substrate with the ruthenium tetroxide, and/or after contacting the substrate with the ruthenium tetroxide. In some embodiments of the disclosure, the reducing agent may be introduced into the reaction chamber and contact the substrate simultaneously with the first vapor phase reactant and/or simultaneously with the second vapor phase reactant. For example, the reducing agent and the first vapor phase reactant may be co-flowed into the reaction chamber and simultaneously contact the substrate, and/or the reducing agent and the second vapor phase reactant may be co-flowed into the reaction chamber and simultaneously contact the substrate. In some embodiments the reducing agent may be introduced after multiple cycles of first vapor phase reactant and second vapor phase reactant. In some embodiments the reducing agent may be introduced after multiple cycles of first vapor phase reactant and second vapor phase reactant have been performed to form an oxygen containing ruthenium film. In some embodiments the reducing agent may be introduced to reduce a film comprising metal from metal organic precursor and ruthenium and oxygen to metallic alloy film. In some embodiments the reducing agent may be introduced to reduce a film comprising metal from metal organic precursor and ruthenium.

Thin films comprising a ruthenium-containing film or an osmium-containing film, such as, for example, a ruthenium-metal alloy, deposited according to some of the embodiments described herein may be continuous thin films. In some embodiments the thin films comprising a ruthenium-containing film deposited according to some of the embodiments described herein may be continuous at a thickness below about 100 nm, below about 60 nm, below about 50 nm, below about 40 nm, below about 30 nm, below about 25 nm, or below about 20 nm or below about 15 nm or below about 10 nm or below about 5 nm or lower. The continuity referred to herein can be physically continuity or electrical continuity. In some embodiments the thickness at which a film may be physically continuous may not be the same as the thickness at which a film is electrically continuous, and the thickness at which a film may be electrically continuous may not be the same as the thickness at which a film is physically continuous.

In some embodiments, a ruthenium-containing film or an osmium-containing film deposited according to some of the embodiments described herein may have a thickness from about 20 nm to about 100 nm. In some embodiments, a ruthenium-containing film deposited according to some of the embodiments described herein may have a thickness from about 20 nm to about 60 nm. In some embodiments, a ruthenium-containing film deposited according to some of the embodiments described herein may have a thickness greater than about 20 nm, greater than about 30 nm, greater than about 40 nm, greater than about 50 nm, greater than about 60 nm, greater than about 100 nm, greater than about 250 nm, greater than about 500 nm, or greater. In some embodiments a ruthenium-containing film deposited according to some of the embodiments described herein may have a thickness of less than about 50 nm, less than about 30 nm, less than about 20 nm, less than about 15 nm, less than about 10 nm, less than about 5 nm, less than about 3 nm, less than about 2 nm, or even less than about 1 nm.

In some embodiments of the disclosure, the ruthenium-containing film may be deposited on a three-dimensional structure. In some embodiments, the step coverage of the ruthenium-containing film may be equal to or greater than about 50%, greater than about 80%, greater than about 90%, about 95%, about 98%, or about 99% or greater in structures having aspect ratios (height/width) of more than about 2, more than about 5, more than about 10, more than about 25, more than about 50, or even more than about 100.

In some embodiments of the disclosure, the exemplary method 100 of FIG. 1 may be employed for the deposition of an elemental metal film on a substrate. In some embodiments, the first vapor phase reactant may comprise a metalorganic precursor which contains the desired elemental metal to be deposited. For example, the metalorganic precursor may comprise an elemental metal from Groups 2-15 of the periodic table. In some embodiments, the metalorganic precursor may comprise an elemental metal selected from the group of cobalt (Co), nickel (Ni), tungsten (W), molybdenum (Mo), manganese (Mn), and iron (Fe).

In some embodiments, the method 100 may be particularly employed to deposit a cobalt (Co) film on a substrate. For example, the method 100 may comprise, contacting the substrate with a metalorganic precursor which includes elemental cobalt, i.e., a metalorganic cobalt precursor, and contacting the substrate with a ruthenium oxide (RuO₄) precursor. Not to be bound by any particular theory, but it is believed that the ALD of an elemental metal utilizing an oxygen source (e.g., RuO₄) may comprise the oxidative decomposition of the metal precursor.

In some embodiments of the disclosure, the exemplary methods 100 may be employed for the deposition of a ruthenium-metal alloy, the ruthenium-metal alloy having the general formula Ru-M, wherein Ru is ruthenium and M is a metal selected from the group of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. In some embodiments, the ruthenium-metal alloy comprises a binary alloy consisting of a first metal consisting of ruthenium and a second metal consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, or combinations thereof.

In some embodiments of the disclosure, the exemplary methods 100 may be employed for the deposition of an osmium-metal alloy, the osmium-metal alloy having the general formula Os-M, wherein Os is osmium and M is a metal selected from the group of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof. In some embodiments, the osmium-metal alloy comprises a binary alloy consisting of a first metal consisting of osmium and a second metal consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, or combinations thereof.

In some embodiments of the disclosure, the ruthenium-metal alloy (Ru-M) may comprise a ruthenium content of greater than 5 atomic %, or greater than 10 atomic %, or greater than 15 atomic %, or greater than 25 atomic %, or greater than 50 atomic %, or greater than 75 atomic %, or even greater than 90 atomic %. In some embodiments, the ruthenium-metal alloy may comprise a ruthenium content of approximately 50 atomic %. In additional embodiments, the ruthenium-metal alloy may comprise less than about 20 atomic % oxygen, less than about 10 atomic % oxygen, less than about 5 atomic % oxygen, or even less than about 2 atomic % oxygen. In further embodiments, the ruthenium-metal alloy may comprise less than about 10 atomic % hydrogen, or less than about 5 atomic % of hydrogen, or less than about 2 atomic % of hydrogen, or even less than about 1 atomic % of hydrogen. In yet further embodiments, the ruthenium-metal alloy may comprise less than about 10 atomic % carbon, or less than about 5 atomic % carbon, or less than about 2 atomic % carbon, or less than about 1 atomic % of carbon, or even less than about 0.5 atomic % carbon. In the embodiments outlined herein, the atomic concentration of an element may be determined utilizing Rutherford backscattering (RBS).

The ruthenium-metal alloys and osmium-metal alloys deposited by the cyclical deposition processes disclosed herein may be utilized in variety of contexts, such as, for example, as a gate electrode to a semiconductor device structure, as a barrier material/capping layer in electrical interconnect applications, and as a via or trench fill material.

In some embodiments of the disclosure, the ruthenium-metal alloy deposited by the methods disclosure herein may be utilized as a work function metal in a transistor structure, such as, for example, a planar transistor structure or a multiple gate transistor, such as a FinFET. In more detail, and with reference to FIG. 2, a semiconductor device structure 200 may comprise a semiconductor body 216 and a gate electrode 210 comprising a ruthenium-metal alloy disposed over the semiconductor body 216. In some embodiments, the semiconductor device structure 200 may comprise a transistor structure and may also include a source region 202, a drain region 204, and a channel region 206 there between. A transistor gate structure 208 may comprise an electrode 210, i.e., a gate electrode, which may be separated from the channel region 206 by a gate dielectric 212. According to the present disclosure, the gate electrode 210 may comprise a ruthenium-metal alloy, deposited by the cyclical deposition methods described herein. As shown in FIG. 2, in some embodiments the transistor gate structure 208 may further comprise one or more additional conductive layers 214 formed on the gate electrode 210. The one or more additional conductive layers 214 may comprise at least one of a polysilicon, a refractory metal, a transition metal carbide, a transition metal nitride, other conductive metallic materials, or mixtures thereof.

In some embodiments of the disclosure, the gate electrode 210 may comprise a ruthenium-cobalt alloy deposited according to the embodiments of the present disclosure. In some embodiments, the composition of the ruthenium-cobalt may be modulated by varying the ruthenium-cobalt compositional ratio to tune the work function value of the transistor gate structure 208. For example, the ruthenium-cobalt compositional ratio may be tuned from pure cobalt (Co), through to pure ruthenium (Ru), with a corresponding change in the overall work function of the transistor gate structure 208. In some embodiments, a gate electrode 210 comprising a ruthenium-cobalt alloy may have a suitable work function for a PMOS gate electrode. In some embodiments, the transistor gate structure 208 may comprise a ruthenium-cobalt metal alloy gate electrode 210 and the overall work function of the transistor gate structure 208 may be greater than 4.1 eV, or greater than 4.5 eV, or greater than 4.7 eV, or greater than 4.9 eV, or greater than 5.0 eV, or greater than 5.1 eV, or less than 6.0 eV.

As another non-limiting example embodiment, a ruthenium-metal alloy may be utilized as a barrier material and/or a capping layer in a back-end-of-line (BEOL) metallization application, as illustrate in FIG. 3. In more detail, FIG. 3 illustrates a partially fabricated semiconductor structure 300 comprising a substrate 302 which may include partially fabricated and/or fabricated semiconductor device structures such as transistors and memory elements (not shown). The partially fabricated semiconductor structure 300 may include a dielectric material 304 formed over the substrate 302 which may comprise a low dielectric constant material, i.e., a low-k dielectric, such as a silicon containing dielectric or a metal oxide. A trench may be formed in the dielectric material 304 and a barrier material 306 may be disposed on the surface of the trench which prevents, or substantially prevents, the diffusion of the metal interconnect material 308 into the surrounding dielectric material 304. In some embodiments of the disclosure, the barrier material 306 may comprise a ruthenium-metal alloy, such as, for example, a ruthenium-cobalt alloy. In some embodiments of the disclosure the ruthenium-metal alloy may have a thickness of less than 500 Angstroms, or less than 300 Angstroms, or less than 100 Angstroms, or less than 50 Angstroms, or less than 20 Angstroms or even less than 10 Angstroms. Not to be bound by any theory, but it is believed that a ruthenium-metal alloy barrier material may be capable of preventing diffusion of the metal interconnect material 308 at a significantly lower thickness than common barrier materials utilized currently for the fabrication of integrated circuits. The partially fabricated semiconductor structure 300 may also comprise a metal interconnect material 308 for electrical interconnecting a plurality of device structures disposed in substrate 302. In some embodiments, the metal interconnect material 308 may comprise one or more of copper, or cobalt.

In addition to the use of a ruthenium-metal alloy as a barrier material, a ruthenium-metal alloy may also be utilized as a capping layer. Therefore, with reference to FIG. 3, the partially fabricated semiconductor structure 300 may also include a capping layer 310 disposed directly on the upper surface of the metal interconnect material 308. The capping layer 310 may be utilized to prevent oxidation of the metal interconnect material 308 and importantly prevent the diffusion of the metal interconnect material 308 into additional dielectric materials formed over the partially fabricated semiconductor structure 300 in subsequent fabrication processes, i.e., for multi-level interconnect structures. In some embodiments of the disclosure, the capping layer 310 may also comprise a ruthenium-metal alloy, such as, for example, a ruthenium-cobalt alloy. In some embodiments of the disclosure, the ruthenium-metal alloy may have a thickness of less than 500 Angstroms, or less than 300 Angstroms, or less than 100 Angstroms, or less than 50 Angstroms, or less than 20 Angstroms, or even less than 10 Angstroms. In some embodiments, the metal interconnect material 308, the barrier material 306, and the capping layer 310 may collectively form an electrode for the electrical interconnection of a plurality of semiconductor devices disposed in the substrate 302.

As another non-limiting example embodiment, a ruthenium-metal alloy may be utilized as a trench fill, also referred to as a via fill, for a three-dimensional semiconductor structure, as illustrated in FIG. 4. In more detail, FIG. 4 illustrates a semiconductor structure 400 which may comprise a dielectric material 402, such as a low dielectric constant material, including, but not limited to, a silicon containing dielectric or a metal oxide. Disposed in the dielectric material 402 is a trench or via structure 404 which extends down from the surface of the dielectric material 402 into the body of the dielectric material. In some embodiments, the trench or via structure 404 may have a depth (d) greater than 10 μm, or greater than 25 μm, or greater than 50 μm, or even greater than 100 μm. In addition, in some embodiments, the trench or via structure 404 may comprise an aspect ratio of greater than 5:1, or greater than 10:1, or greater than 25:1, or greater than 50:1, or even greater than 100:1. In some embodiments of the disclosure, the trench or via structure 404 may be filled with a ruthenium-metal alloy 406, such that the ruthenium-metal alloy completely fills the trench or via structure 404. For example, the ruthenium-metal alloy 406 may comprise a ruthenium-cobalt alloy and the ruthenium-cobalt alloy may fill the trench or via structure 404 without, or substantially without, the formation of voids or seams. In such embodiments, the ruthenium-metal alloy disposed in the trench structure may comprise an electrical electrode.

Embodiments of the disclosure may also include a reaction system configured for forming the ruthenium-containing films and/or the osmium-containing films of the present disclosure. In more detail, FIG. 5 schematically illustrates a reaction system 500 including a reaction chamber 502 that further includes mechanism for retaining a substrate (not shown) under predetermined pressure, temperature, and ambient conditions, and for selectively exposing the substrate to various gases. A precursor reactant source 504 may be coupled by conduits or other appropriate means 504A to the reaction chamber 502, and may further couple to a manifold, valve control system, mass flow control system, or mechanism to control a gaseous precursor originating from the precursor reactant source 504. A precursor (not shown) supplied by the precursor reactant source 504, the reactant (not shown), may be liquid or solid under room temperature and standard atmospheric pressure conditions. Such a precursor may be vaporized within a reactant source vacuum vessel, which may be maintained at or above a vaporizing temperature within a precursor source chamber. In such embodiments, the vaporized precursor may be transported with a carrier gas (e.g., an inactive or inert gas) and then fed into the reaction chamber 502 through conduit 504A. In other embodiments, the precursor may be a vapor under standard conditions. In such embodiments, the precursor does not need to be vaporized and may not require a carrier gas. For example, in one embodiment the precursor may be stored in a gas cylinder. The reaction system 500 may also include additional precursor reactant sources, such precursor reactant source 506 which may also be couple to the reaction chamber by conduits 506A as described above.

A purge gas source 508 may also be coupled to the reaction chamber 502 via conduits 508A, and selectively supplies various inert or noble gases to the reaction chamber 502 to assist with the removal of precursor gas or waste gases from the reaction chamber. The various inert or noble gases that may be supplied may originate from a solid, liquid or stored gaseous form.

The reaction system 500 of FIG. 5, may also comprise a system operation and control mechanism 510 that provides electronic circuitry and mechanical components to selectively operate valves, manifolds, pumps and other equipment included in the reaction system 500. Such circuitry and components operate to introduce precursors, purge gases from the respective precursor sources 504, 506 and purge gas source 508. The system operation and control mechanism 510 also controls timing of gas pulse sequences, temperature of the substrate and reaction chamber, and pressure of the reaction chamber and various other operations necessary to provide proper operation of the reaction system 500. The operation and control mechanism 510 can include control software and electrically or pneumatically controlled valves to control flow of precursors, reactants and purge gases into and out of the reaction chamber 502. The control system can include modules such as a software or hardware component, e.g., a FPGA or ASIC, which performs certain tasks. A module can advantageously be configured to reside on the addressable storage medium of the control system and be configured to execute one or more processes.

Those of skill in the relevant arts appreciate that other configurations of the present reaction system are possible, including different number and kinds of precursor reactant sources and purge gas sources. Further, such persons will also appreciate that there are many arrangements of valves, conduits, precursor sources, purge gas sources that may be used to accomplish the goal of selectively feeding gases into reaction chamber 502. Further, as a schematic representation of a reaction system, many components have been omitted for simplicity of illustration, and such components may include, for example, various valves, manifolds, purifiers, heaters, containers, vents, and/or bypasses.

The example embodiments of the disclosure described above do not limit the scope of the invention, since these embodiments are merely examples of the embodiments of the invention, which is defined by the appended claims and their legal equivalents. Any equivalent embodiments are intended to be within the scope of this invention. Indeed, various modifications of the disclosure, in addition to those shown and described herein, such as alternative useful combination of the elements described, may become apparent to those skilled in the art from the description. Such modifications and embodiments are also intended to fall within the scope of the appended claims. 

What is claimed is:
 1. A method of depositing a ruthenium-containing film on a substrate by a cyclical deposition process, the method comprising: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄); wherein the ruthenium-containing film comprises a ruthenium-metal alloy, and wherein the first vapor phase reactant and the second vapor phase reactant at least one of react or decompose on a surface of the substrate to form the ruthenium-containing film.
 2. The method of claim 1, wherein contacting the substrate with the first vapor phase reactant and contacting the substrate with the second vapor phase reactant comprise forming a barrier layer on a surface of a trench formed in a dielectric material.
 3. The method of claim 2, further comprising depositing a metal interconnect material onto the barrier material within the trench.
 4. The method of claim 3, wherein after depositing the metal interconnect material, the method further comprises contacting the substrate again with the first vapor phase reactant and contacting the substrate again with the second vapor phase reactant to form a capping layer disposed directly on an upper surface of the metal interconnect material.
 5. The method of claim 1, wherein the metalorganic precursor is free of calcium, strontium, and barium.
 6. The method of claim 1, wherein the metalorganic precursor comprises a metalorganic cobalt precursor selected from the group consisting of bis(acetylacetonate)cobalt(II), bis(ethylcyclopentadienyl)cobalt(II), bis(2,2,6,6-tetramethyl-3,5-heptanedionato)cobalt(II), bis(1,4-di-tert-butyl-1,3-diazabutadiene)cobalt(II), or bis(N-tert-butyl-N′-ethylpropanimidamidato) cobalt(II).
 7. The method of claim 6, wherein the ruthenium-metal alloy comprises a ruthenium-cobalt alloy.
 8. The method of claim 1, wherein the metalorganic precursor comprises a metalorganic manganese precursor selected from the group consisting of bis(N,N′-di-isopropylpentylamidinato)manganese(II), bis(cyclopentadienyl)manganese(II), or cyclopentadienylmanganese(I)tricarbonyl.
 9. The method of claim 8, The method of claim 14, wherein the ruthenium-metal alloy comprises a ruthenium-manganese alloy.
 10. The method of claim 1, wherein the metalorganic precursor comprises a metalorganic iron precursor selected from the group consisting of bis(N,N′-di-tertbutylacetamidinato)iron(II), bis(cyclopentadienyl)iron(II) or cyclohexadienetricarbonyliron(0).
 11. The method of claim 10, wherein the ruthenium-metal alloy comprises a ruthenium-iron alloy.
 12. The method of claim 1, further comprising contacting the substrate with a third vapor phase reactant comprising a reducing agent.
 13. The method of claim 12, wherein the reducing agent comprises at least one of hydrogen plasma, hydrogen radicals, hydrogen atoms, excited species of hydrogen, ammonia (NH₃), an ammonia (NH₃) plasma, hydrazine (N₂H₄), silane (SiH₄), disilane (Si₂H₆), trisilane (Si₃H₈), germane (GeH₄), digermane (Ge₂H₆), diborane (B₂H₆), or an organic precursor.
 14. The method of claim 1, wherein contacting the substrate with the first vapor phase reactant is performed for a first time period and wherein contacting the substrate with the second vapor phase reactant is performed for a second time period, wherein the second period is longer than the first time period.
 15. The method of claim 1, wherein the method comprises atomic layer deposition or chemical vapor deposition.
 16. A method of depositing a ruthenium-containing film on a substrate by a cyclical deposition process, the method comprising: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof; contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄); wherein the ruthenium-containing film comprises a ruthenium-metal alloy, and wherein the first vapor phase reactant and the second vapor phase reactant do not condense into a monolayer on a surface of the substrate.
 17. The method of claim 16, wherein the first vapor phase reactant and the second vapor phase reactant do not decompose on the surface of the substrate.
 18. A method of depositing a ruthenium-containing film on a substrate by a cyclical deposition process, the method comprising: contacting the substrate with a first vapor phase reactant comprising a metalorganic precursor, the metalorganic precursor comprising a metal selected from the group consisting of cobalt, nickel, tungsten, molybdenum, manganese, iron, and combinations thereof; and contacting the substrate with a second vapor phase reactant comprising ruthenium tetroxide (RuO₄); wherein the ruthenium-containing film comprises a ruthenium-metal alloy wherein contacting the substrate with the first vapor phase reactant and contacting the substrate with the second vapor phase reactant comprise forming a barrier layer on a surface of a trench formed in a dielectric material.
 19. The method of claim 18, further comprising depositing a metal interconnect material onto the barrier material with the trench.
 20. The method of claim 19, wherein after deposition the metal interconnect material, the method further comprises contacting the substrate again with the first vapor phase reactant and contacting the substrate again with the second vapor phase reactant to form a capping layer disposed directly on an upper surface of the metal interconnect material. 